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Nano Imaging Lab
Technologies
SEM und Cryo-SEM
FEI Helios Nano Lab 650
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Nanosciences
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Bachelor's program
Master's program
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Services
Nano Imaging Lab
Nano Fabrication Lab
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SEM – FEI Helios Nano Lab 650
Technical specifications
High Resolution Field Emission (Schottky) Scanning Microscope (Dual Beam)
Resolution of the electron beam:
– 0.8 nm at 15 kV
– 1.5 nm at 200 V
Resolution of the ion beam:
– 4.0 nm at 30 kV using preferred statistical method
– 2.5 nm at 30 kV using selective edge method
Maximum sample size: 150 mm in diameter, 55 mm in height
Maximum sample weight: 500 g (incl. sample holder)
Detectors and micro analysis
Elstar in-lens SE detector (TLD-SE)
Elstar in-lens BSE detector (TLD-BSE)
Everhart-Thornley SE detector (ETD)
Energy Dispersive X-Ray Spectroscopy (EDX), Genesis & Team software
Typical applications and accessories
Imaging, analysis, milling, patterning of specimens down to the nanoscale
TEM lift out / TEM lamella
Nanofabrication and micromanipulation
Multiple gas injection system for Pt-, W-, C-, Co- and H20- deposition
Correlative Microscopy (LM – SEM)
3-axis and Rotip Kleindiek micromanipulator
Lift Out Shuttle from Kleindiek
Eucentric five Axis Table from Kleindiek
Location
Pharmazentrum, U1007
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