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Nano Imaging Lab
Technologies
SEM und Cryo-SEM
FEI Versa 3D DualBeam
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About us
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Nanosciences
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Member and project lists
Study program
General information
Bachelor's program
Master's program
PhD and job
Services
Nano Imaging Lab
Nano Fabrication Lab
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SNI INSight
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SEM – FEI Versa 3D DualBeam
Technical specifications
High-resolution field emission scanning electron microscope with Schottky emitter
Magnification: 30x – 1280kx in “Quad” mode
Resolution electron beam:
1.2nm at 30kV
2.9nm at 1kV
Ion Beam Resolution:
7 nm at 30 kV at the beam coincidence point (5 nm achievable with optimum working distance)
Standard 5-axis motor table:
X, Y: 110mm
Z: 65 mm motorized
T: -15° to +90°
R: n x 360° (endless)
X, Y repeatability: 2.0 μm
Sample weight: 500g in any stage position (up to 2kg at 0 degree tilt)
Maximum distance between stage and point of coincidence: 85 mm at eucentric height
Maximum sample size: – 150mm diameter at full rotation (larger samples possible with limited rotation)
Detectors and micro analysis
Everhart-Thornley SE Detector (ETD)
Retractable low voltage and backscattered electron detector
IR camera for viewing the sample/column
High performance SE and SI (secondary ion) detector (ICE)
Detector for Energy Dispersive X-ray Spectroscopy (Apollo EDX) with Genesis & Team Software (EDAX)
Typical applications and accessories
Imaging, analyzing, milling and structuring of samples down to the nanometer range
TEM excavation / TEM lamella
Nanofabrication and micromanipulation
Gas injection system for Au and Pt deposition (FEBID and FIBID); C deposition (only FEBID)
Kleindiek micromanipulator
Location
Pharmazentrum, U1007
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