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Nano Imaging Lab
Technologies
SEM und Cryo-SEM
Zeiss FIB-SEM Crossbeam 540
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Nanosciences
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General information
Bachelor's program
Master's program
PhD and job
Services
Nano Imaging Lab
Nano Fabrication Lab
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SNI INSight
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SEM – Zeiss FIB-SEM Crossbeam 540
Technical specifications
High-resolution field emission scanning electron microscope optimized for use with a Ga-focused Ion beam (Ga-FIB)
6-axes motorized super-eucentric stage
Specimen stage movement: XY 100 mm, Z 50 mm
Airlock 80mm gate opening
Magnification: 33 x - 5000K x
Resolution electron beam:
0.9 nm at 15 kV
FIB Capella column (Ga-LMIS):
Ion Beam Resolution: 3 nm at 30 kV
Voltage range: 500 V - 30 kV
Probe current range: 1 pA - 100 nA
Detectors and micro analysis
SESI Detector for imaging of secondary electrons or of secondary ions
Energy selective backscattered in-lens detector
BSD retractable diode detector with 4 quadrants
Typical applications and accessories
Imaging, analyzing, milling and cross sectioning of samples down to the nanometer range
TEM lamella lift out and thinning
Nanofabrication and micromanipulation
Gas injection system for Pt deposition (FEBID and FIBID)
3-axis and Rotip Kleindiek micromanipulator
Location
Pharmazentrum, U1097
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