Technical Specifications

• Extra-large sample chamber with an inner diameter of 520 mm and a height of 307 mm
• Airlock with an 80 mm opening
• Navigation camera (mounted on the 80 mm airlock) for capturing images of samples for SmartSEM Image
• 6-axes motorized super-eucentric stage
• Sample stage travel: XY 153 mm, Z 50 mm
• Field-emission scanning electron microscope (FE-SEM) with patented GEMINI® II electron optics for fast, high-resolution analysis and imaging. The FE-SEM is designed for operation with a focused Ga ion beam (Ga-FIB)
• To increase resolution, the SEM column can be switched to a special high-resolution mode (High Resolution Gun Mode) on the emitter side
• Resolution electron beam:
  • 0.6 nm at 30 kV STEM (optional)
  • 0.7 nm at 15 kV
  • 1.4 nm at 1kV
  • 1.2 nm at 1kV with Tandem Decel Option
  • 1.3 nm at 200V with Tandem Decel Option
  • Resolution at the point of coincidence FE-SEM/Ga-FIB: 0.9 nm at 15 kV, 1.8 nm at 1 kV (1.3 nm at 1 kV at Tandem Decel Option)
  • Acceleration voltage: 20 V – 30 kV
  • Beam current: 10 pA – 40 nA 
• FIB-Ion-sculptor:
  • Optimal lateral resolution: 3 nm at 30 KV
  • Range of energy: 500 V – 30 kV
  • Beam current: 1 pA – 100 nA

Detectors and Microanalysis

• Chamber secondary electron detector (Everhart-Thornley)
• In-lens SE detector
• In-lens EsB detector: Energy-selective detection of backscattered electrons
• Pneumatically retractable, high-efficiency, annular 5-sector BSE semiconductor detector. The outer ring consists of 4 quarters, which enable the acquisition of topographic contrast
• Oxford Instruments EDS system: AZtecLive Standard with Ultim Max Infinity (sensor size 170 mm²)

Typical Applications and Accessories

• Imaging, analyzing, milling, and cross-sectioning of samples at the nanometer scale
• TEM lamella: “lift-out” and thinning
• Gas injection system for C deposition (FEBID and FIBID)
• Gas cartridge for increased material removal (water): MgSO₄ x 7H₂O
• Nanofabrication and micromanipulation

Location

Pharmazentrum, U1039