SEM – FEI Versa 3D DualBeam

Technical specifications

Versa DualBeam
  • High-resolution field emission scanning electron microscope with Schottky emitter
  • Magnification: 30x – 1280kx in “Quad” mode
  • Resolution electron beam:
    • 1.2nm at 30kV
    • 2.9nm at 1kV
  • Ion Beam Resolution:
    • 7 nm at 30 kV at the beam coincidence point (5 nm achievable with optimum working distance)
  • Standard 5-axis motor table:
    • X, Y: 110mm
    • Z: 65 mm motorized
    • T: -15° to +90°
    • R: n x 360° (endless)
    • X, Y repeatability: 2.0 μm
    • Sample weight: 500g in any stage position (up to 2kg at 0 degree tilt)
    • Maximum distance between stage and point of coincidence: 85 mm at eucentric height
    • Maximum sample size: – 150mm diameter at full rotation (larger samples possible with limited rotation)

Detectors and micro analysis

  • Everhart-Thornley SE Detector (ETD)
  • Retractable low voltage and backscattered electron detector
  • IR camera for viewing the sample/column
  • High performance SE and SI (secondary ion) detector (ICE)
  • Detector for Energy Dispersive X-ray Spectroscopy (Apollo EDX) with Genesis & Team Software (EDAX)

Typical applications and accessories

  • Imaging, analyzing, milling and structuring of samples down to the nanometer range
  • TEM excavation / TEM lamella
  • Nanofabrication and micromanipulation
  • Gas injection system for Au and Pt deposition (FEBID and FIBID); C deposition (only FEBID)
  • Kleindiek micromanipulator

Location

Pharmazentrum, U1007