SEM – FEI Versa 3D DualBeam
Technical specifications
- High-resolution field emission scanning electron microscope with Schottky emitter
- Magnification: 30x – 1280kx in “Quad” mode
- Resolution electron beam:
- 1.2nm at 30kV
- 2.9nm at 1kV
- Ion Beam Resolution:
- 7 nm at 30 kV at the beam coincidence point (5 nm achievable with optimum working distance)
- Standard 5-axis motor table:
- X, Y: 110mm
- Z: 65 mm motorized
- T: -15° to +90°
- R: n x 360° (endless)
- X, Y repeatability: 2.0 μm
- Sample weight: 500g in any stage position (up to 2kg at 0 degree tilt)
- Maximum distance between stage and point of coincidence: 85 mm at eucentric height
- Maximum sample size: – 150mm diameter at full rotation (larger samples possible with limited rotation)
Detectors and micro analysis
- Everhart-Thornley SE Detector (ETD)
- Retractable low voltage and backscattered electron detector
- IR camera for viewing the sample/column
- High performance SE and SI (secondary ion) detector (ICE)
- Detector for Energy Dispersive X-ray Spectroscopy (Apollo EDX) with Genesis & Team Software (EDAX)
Typical applications and accessories
- Imaging, analyzing, milling and structuring of samples down to the nanometer range
- TEM excavation / TEM lamella
- Nanofabrication and micromanipulation
- Gas injection system for Au and Pt deposition (FEBID and FIBID); C deposition (only FEBID)
- Kleindiek micromanipulator
Location
Pharmazentrum, U1007