SEM – Zeiss FIB-SEM Crossbeam 540

Technical specifications

Crossbeam
  • High-resolution field emission scanning electron microscope optimized for use with a Ga-focused Ion beam (Ga-FIB)
  • 6-axes motorized super-eucentric stage
  • Specimen stage movement: XY 100 mm, Z 50 mm
  • Airlock 80mm gate opening
  • Magnification: 33 x - 5000K x
  • Resolution electron beam:
    • 0.9 nm at 15 kV
  • FIB Capella column (Ga-LMIS):
    • Ion Beam Resolution: 3 nm at 30 kV
    • Voltage range: 500 V - 30 kV
    • Probe current range: 1 pA - 100 nA

Detectors and micro analysis

  • SESI Detector for imaging of secondary electrons or of secondary ions
  • Energy selective backscattered in-lens detector
  • BSD retractable diode detector with 4 quadrants

Typical applications and accessories

  • Imaging, analyzing, milling and cross sectioning of samples down to the nanometer range
  • TEM lamella lift out and thinning
  • Nanofabrication and micromanipulation
  • Gas injection system for Pt deposition (FEBID and FIBID)
  • 3-axis and Rotip Kleindiek micromanipulator

Location

Pharmazentrum, U1097