SEM – Zeiss FIB-SEM Crossbeam 540
Technical specifications
- High-resolution field emission scanning electron microscope optimized for use with a Ga-focused Ion beam (Ga-FIB)
- 6-axes motorized super-eucentric stage
- Specimen stage movement: XY 100 mm, Z 50 mm
- Airlock 80mm gate opening
- Magnification: 33 x - 5000K x
- Resolution electron beam:
- 0.9 nm at 15 kV
- FIB Capella column (Ga-LMIS):
- Ion Beam Resolution: 3 nm at 30 kV
- Voltage range: 500 V - 30 kV
- Probe current range: 1 pA - 100 nA
Detectors and micro analysis
- SESI Detector for imaging of secondary electrons or of secondary ions
- Energy selective backscattered in-lens detector
- BSD retractable diode detector with 4 quadrants
Typical applications and accessories
- Imaging, analyzing, milling and cross sectioning of samples down to the nanometer range
- TEM lamella lift out and thinning
- Nanofabrication and micromanipulation
- Gas injection system for Pt deposition (FEBID and FIBID)
- 3-axis and Rotip Kleindiek micromanipulator
Location
Pharmazentrum, U1097